Professor Ge Wang has received industrial support from Applied Materials to advance the development of foundation models for computed tomography reconstruction of semiconductors. This project builds on Professor Wang’s long-standing expertise in CT, inverse problems, and AI-driven foundation models for imaging, while leveraging RPI’s innovative portfolio. The collaboration reflects the growing convergence of artificial intelligence, advanced imaging, and semiconductor manufacturing. By adapting technologies originally pioneered for biomedical imaging, the project aims to enable new capabilities in non-destructive semiconductor characterization, inspection, and process optimization. This effort underscores the expanding impact of imaging science beyond healthcare and highlights the potential for cross-disciplinary innovation to address critical challenges in advanced manufacturing. This work is also supported by the Empire State Development Focus Center at RPI.
